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We systemize the experimental data on the relationship of the specific electrical resistance, density, structure, and composition of thin ruthenium layers (TRLs) synthesized in the temperature range 160-310 °C by pulsed chemical vapor deposition with a carbonyl-diene precursor Ru(CO)3(C6H8) and NH3 and N2O as second reagents. The main impurity in TRLs after their deposition and annealing is carbon...
This paper is devoted to the investigation of the ruthenium films, chemically vapor deposited under low temperature and sequentially pulsed gas injection conditions. Experimental results presented and published in 2006-2008 have been briefly consolidated. This paper can be interesting to those working in modern precision technologies as well as postgraduate students.
This work demonstrates the vapor phase deposition of copper films with a volatile Cu(I) β-diketiminate precursor. X-ray photoelectron spectroscopy (XPS) depth profiles of the deposited films show only background levels of carbon and oxygen. Film thickness depends on the length of precursor pulse, but the surface roughness does not, a result that suggests a uniform deposition. XPS data for the chemisorbed...
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